Nano-patterning exposure device "PhableR 100"
Achieving resolution beyond the diffraction limit! An exposure system that can create periodic structures at low cost.
The "PhableR 100" is a low-cost exposure system capable of producing high-resolution periodic structures. Photoresist is coated, and a mask is set in proximity for exposure. Thanks to unique technology, it achieves resolution beyond the diffraction limit. It can create sub-micron scale gratings and 2D patterns in hexagonal and triangular arrangements. 【Features】 ■ High resolution with a pitch of 300nm or less ■ Achieves a pitch of 150nm with DUV light source selection ■ Full-area exposure ■ Non-contact: protects the mask from damage and contamination ■ Virtually unlimited depth direction focus *For more details, please refer to the PDF document or feel free to contact us.
- Company：協同インターナショナル
- Price：Other
